The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2021

Filed:

May. 21, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Nam H. Nguyen, Pleasantville, NY (US);

Jayant R. Kalagnanam, Briarcliff Manor, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/418 (2006.01); G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G05B 19/41875 (2013.01); G05B 19/4183 (2013.01); G05B 19/41885 (2013.01); G06N 20/00 (2019.01);
Abstract

Methods and systems for determining an optimized set point for a manufacturing apparatus are described. In an example, a processor may receive observed data from the manufacturing apparatus. The observed data may include data collected by the manufacturing apparatus based on at least one resolution. The processor may generate feature data based on the observed data. The processor may determine a first model and a second model based on the feature data. The first model may relate to a first prediction of a key performance indicator of the manufacturing apparatus in a first amount of future time. The second model may relate to a second prediction of the key performance indicator of the manufacturing apparatus in a second amount of future time. The processor may determine the optimized set point based on an objective relating to the first model and based on a constraint relating to the second model.


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