The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Dec. 20, 2018
Canon Kabushiki Kaisha, Tokyo, JP;
Kathryn Brenda Bean, Liberty Hill, TX (US);
Teresa Perez Estrada, Pflugerville, TX (US);
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A plurality of images of a plurality of fields is acquired using an image sensor under varying conditions associated with a defect. Defect pixels in a test image in the plurality of images are identified using a standard image to provide a defect tolerance level. The standard image has no defects. Clustering analysis is performed on the identified defect pixels based on the defect tolerance level to obtain defect clusters. A process window is generated based on the defect clusters. An imprint process is created according to the process window.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile