The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Mar. 07, 2013
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventor:
Nozomu Hayashi, Utsunomiya, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 23/544 (2006.01); H01L 21/66 (2006.01); B29C 59/02 (2006.01); B29C 59/00 (2006.01); G03F 9/00 (2006.01); G03F 7/00 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); B29L 31/34 (2006.01); B29L 9/00 (2006.01); B29K 101/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70608 (2013.01); B29C 59/002 (2013.01); B29C 59/026 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 7/0002 (2013.01); G03F 9/7088 (2013.01); H01L 22/12 (2013.01); H01L 23/544 (2013.01); B29K 2101/00 (2013.01); B29L 2009/00 (2013.01); B29L 2031/34 (2013.01); G03F 9/7046 (2013.01); H01L 2924/0002 (2013.01);
Abstract
A imprint method includes contacting the pattern formed on the mold M with the imprint material R supplied to a shot on the substrate W; and detecting a plurality of alignment marks AMM and AMW in the contacting while changing a position of a detector for detecting the plurality of alignment marks AMM and AMW formed on the shot on the substrate W in accordance with a progress of filling of the imprint material R into the pattern formed on the mold M.