The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2021

Filed:

Oct. 24, 2018
Applicant:

Vapor Technologies, Inc., Longmont, CO (US);

Inventors:

Vladimir Gorokhovsky, Lafayette, CO (US);

Ganesh Kamath, Longmont, CO (US);

Bryce Anton, Longmont, CO (US);

Rudi Koetter, Longmont, CO (US);

Assignee:

VAPOR TECHNOLOGIES, INC., Longmont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/22 (2006.01); C23C 14/32 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 14/325 (2013.01); C23C 14/228 (2013.01); H01J 37/32055 (2013.01); H01J 37/3266 (2013.01); H01J 37/32614 (2013.01);
Abstract

A coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall defines a chamber center. A plasma source is positioned at the chamber center. The coating system also includes a sample holder that holds a plurality of substrates to be coated which is rotatable about the chamber center at a first distance from the chamber center. A first isolation shield is positioned about the chamber center at a second distance from the chamber center, the first isolation shield being negatively charged.


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