The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
May. 17, 2017
Illumina, Inc., San Diego, CA (US);
Yir-Shyuan Wu, Albany, CA (US);
Yan-You Lin, Fremont, CA (US);
M. Shane Bowen, San Diego, CA (US);
Cyril Delattre, San Diego, CA (US);
Fabien Abeille, Grenoble, FR;
Tarun Khurana, Fremont, CA (US);
Arnaud Rival, Grenoble, FR;
Poorya Sabounchi, Atherton, CA (US);
Dajun Yuan, San Diego, CA (US);
Maria Candelaria Rogert Bacigalupo, San Diego, CA (US);
Illumina, Inc., San Diego, CA (US);
Abstract
Embodiments provided herewith are directed to self-assembled methods of preparing a patterned surface for sequencing applications including, for example, a patterned flow cell or a patterned surface for digital fluidic devices. The methods utilize photolithography to create a patterned surface with a plurality of microscale or nanoscale contours, separated by hydrophobic interstitial regions, without the need of oxygen plasma treatment during the photolithography process. In addition, the methods avoid the use of any chemical or mechanical polishing steps after the deposition of a gel material to the contours.