The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2021

Filed:

Dec. 18, 2019
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Shigeki Uehira, Kanagawa, JP;

Naoyuki Morooka, Kanagawa, JP;

Takafumi Nakayama, Kanagawa, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08G 64/04 (2006.01); C08G 64/16 (2006.01); G02B 5/30 (2006.01); G02F 1/13363 (2006.01);
U.S. Cl.
CPC ...
C08G 64/04 (2013.01); C08G 64/16 (2013.01); G02B 5/3083 (2013.01); B32B 2457/202 (2013.01); C09K 2323/03 (2020.08); C09K 2323/035 (2020.08); G02F 1/13363 (2013.01); G02F 2001/133637 (2013.01);
Abstract

An object of the present invention is to provide a phase difference film that can exhibit sufficient reciprocal wavelength dispersibility. The present invention includes a copolymer containing at least one selected from a unit represented by Formula (1) and a unit represented by Formula (2), and a unit represented by Formula (3), in which 20 nm<Re (548)<300 nm, 0.5<Re (446)/Re (548)<1.0, and 1.0<Re (629)/Re (548)<2.0. Here, Re (446), Re (548), and Re (629) represent in-plane retardations at wavelengths of 446 nm, 548 nm, and 629 nm, respectively.


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