The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Apr. 28, 2014
Applicant:
Wacker Chemie Ag, Munich, DE;
Inventors:
Simon Pedron, Burghausen, DE;
Gerhard Forstpointner, Kastl, DE;
Assignee:
WACKER CHEMIE AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 4/00 (2006.01); B01J 8/18 (2006.01); C01B 33/03 (2006.01); C01B 33/027 (2006.01); B01J 8/00 (2006.01); B01J 8/24 (2006.01); C23C 16/24 (2006.01); C23C 16/442 (2006.01);
U.S. Cl.
CPC ...
C01B 33/03 (2013.01); B01J 4/002 (2013.01); B01J 4/004 (2013.01); B01J 4/008 (2013.01); B01J 8/0015 (2013.01); B01J 8/1818 (2013.01); B01J 8/1827 (2013.01); B01J 8/1836 (2013.01); B01J 8/1872 (2013.01); B01J 8/24 (2013.01); C01B 33/027 (2013.01); C23C 16/24 (2013.01); C23C 16/442 (2013.01); B01J 2208/00752 (2013.01); B01J 2208/00761 (2013.01); B01J 2208/00902 (2013.01); B01J 2208/00911 (2013.01); B01J 2208/065 (2013.01);
Abstract
The fluidized bed process for preparing polysilicon by chemical vapor deposition is improved by positioning at least one Laval nozzle upstream from a gas inlet into the reactor.