The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Mar. 29, 2017
Kanto Denka Kogyo Co., Ltd., Tokyo, JP;
Yoshinao Takahashi, Tokyo, JP;
Korehito Kato, Shibukawa, JP;
Yoshimasa Sakurai, Shibukawa, JP;
Hiroki Takizawa, Shibukawa, JP;
Sho Kikuchi, Shibukawa, JP;
Shinichi Kawaguchi, Shibukawa, JP;
Yoshihiko Iketani, Shibukawa, JP;
Yukinobu Shibusawa, Shibukawa, JP;
KANTO DENKA KOGYO CO., LTD., Tokyo, JP;
Abstract
A chlorine fluoride feeding device and feeding process are provided that can stably generate industrially applicable chlorine fluoride (ClF), control flow rate, and provide continual feed. The feeding process of chlorine fluoride of this invention is a feeding process to feed chlorine fluoride generated by loading a gas that contains fluorine atoms and a gas that contains chlorine atoms to a flow-type heat reactor or a plasma reactor, and it can stably generate and safely feed chlorine fluoride for a long time by reacting chlorine fluoride that is difficult to pack at a high pressure, such that an amount that can be packed in a gas container such as a gas cylinder is limited, with two or more types of gas materials that can be packed safely in a gas container by liquefaction, or with such gas material and a solid material.