The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2021

Filed:

Dec. 11, 2019
Applicant:

Rf Printing Technologies Llc, Pittsford, NY (US);

Inventors:

Richard Mu, Irvine, CA (US);

Yonglin Xie, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/045 (2006.01);
U.S. Cl.
CPC ...
B41J 2/04505 (2013.01); B41J 2/0458 (2013.01); B41J 2/04581 (2013.01);
Abstract

A first swath of first dots is printed, such that each column of first dots is disposed along a first direction and is spaced apart from other columns of first dots along a scan direction. Allowable locations of first dots have an irregular extent along at least a first stitch boundary of the first swath. A second swath of second dots is printed similarly. A first stitch boundary of the second swath is proximate to the first stitch boundary of the first swath to form a first stitched region. Allowable locations of second dots have an irregular extent along at least the first stitch boundary of the second swath that is complementary to the irregular extent along the first stitch boundary of the first swath, where the allowable locations of first dots and the second dots in the first stitched region are substantially not interspersed along the first direction.


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