The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Mar. 12, 2014
U.s.a. As Represented BY the Administrator of the National Aeronautics and Space Administration, Washington, DC (US);
Frank L. Palmieri, Hampton, VA (US);
Vincent B. Cruz, Hayes, VA (US);
Christopher J. Wohl, Jr., Portsmouth, VA (US);
Abstract
A soft lithography template or stamp is made by casting a polydimethysiloxane (PDMS) or other suitable elastomeric precursor onto a master pattern. The master pattern may be formed utilizing known micro-fabrication techniques. The PDMS template includes an inverse copy of the micro-structures on the master pattern, and can be placed into a mold used to prepare a carbon-fiber reinforced polymer composite part or other polymer molding systems where a matrix material passes through a fluid state during the cure process. The liquid resin material flows into the structures on the surface of the PDMS template and hardens during the curing cycle. After the part is released from the mold, the PDMS template can be peeled from the surface of the part to reveal the free standing micro structures which are a replica of the master pattern.