The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Feb. 12, 2018
Suss Microtec Photomask Equipment Gmbh & Co. KG, Sternenfels, DE;
Uwe Dietze, Austin, TX (US);
Habib Hichri, Corona, CA (US);
Seongkuk Lee, Corona, CA (US);
Davide Dattilo, Bretten, DE;
Martin Samayoa, Corona, CA (US);
SUSS MICRO TEC PHOTOMASK EQUIPMENT GMBH & CO KG, Sternenfels, DE;
Abstract
A method and an apparatus for cleaning a substrate having at least one surface having a residue to be removed thereon is described. The method comprises: scanning at least an area of the surface having the residue thereon with laser light to thereby heat the surface and the residue; controlling the heating so that a part of the residue first liquefies such that the liquefied part of the residue starts flowing towards the solid part of the residue, thereby forming a meniscus with the solid part of the residue and accumulating in part on top of the solid part, the thus generated thicker layer of residue absorbing further heat to be decomposed or vaporized.