The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
May. 30, 2018
Sinwa Corporation, Yokohama, JP;
Akihiro Tanaka, Yokohama, JP;
Sinwa Corporation, Yokohama, JP;
Abstract
Provided is a cosmetic applicator having a coil spring at an applying portion thereof with which mascara may be easily applied to eyelashes. It is preferred that the coil spring not be exactly helicoidal, it being preferred that radial distance from the central axis to the outermost circumferential surface be made to vary as a function of angular position about the central axis. Variation in radial distance from the central axis to the outermost circumferential surface of the coil spring may occur in a repeating pattern of periodicity different from the pitch of the coil spring, causing coil spring shape element(s) to shift in angular position with each turn of the coil spring. Mascara may be held in spaces between adjacent coils, presence of bent portions which shift in the circumferential direction making it possible for the applying portion to easily retain mascara.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile