The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 19, 2021

Filed:

Dec. 13, 2016
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Ryo Mitta, Kamisu, JP;

Hiroshi Hashigami, Annaka, JP;

Takenori Watabe, Annaka, JP;

Hiroyuki Ohtsuka, Nagano, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0224 (2006.01); H01L 31/05 (2014.01); H01L 31/068 (2012.01); H01L 31/18 (2006.01); H01L 31/0236 (2006.01);
U.S. Cl.
CPC ...
H01L 31/0682 (2013.01); H01L 31/02366 (2013.01); H01L 31/022458 (2013.01); H01L 31/0516 (2013.01); H01L 31/1804 (2013.01); Y02E 10/547 (2013.01); Y02P 70/50 (2015.11);
Abstract

In a back contact type solar cell in which an impurity diffusion layer where second conductive type impurities are diffused is formed on a back surface, as a non-light receiving surface, of a first conductive type semiconductor substrate, and an electrode in contact with the impurity diffusion layer is provided, a surface concentration of the impurities in the impurity diffusion layer is not less than 5×10atms/cmand not more than 5×10atms/cm, and a diffusion depth of the impurities in the impurity diffusion layer is not smaller than 1 μm and not larger than 2.9 μm from a top of the back surface. It is thereby possible to provide a high efficiency back contact type solar cell which can be manufactured by a simple method at low cost.


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