The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2021
Filed:
May. 13, 2019
V Technology Co., Ltd., Yokohama, JP;
Sakai Display Products Corporation, Sakai, JP;
Michinobu Mizumura, Yokohama, JP;
Nobutake Nodera, Sakai, JP;
Yoshiaki Matsushima, Sakai, JP;
Masakazu Tanaka, Sakai, JP;
Takao Matsumoto, Sakai, JP;
V Technology Co. Ltd., Yokohama, JP;
Sakai Display Products Corporation, Sakai, JP;
Abstract
A laser irradiation apparatus includes a light source that generates a laser beam, a projection lens that radiates the laser beam onto a predetermined region of an amorphous silicon thin film deposited on each of a plurality of thin film transistors on a glass substrate, and a projection mask pattern provided on the projection lens and has a plurality of openings so that the laser beam is radiated onto each of the plurality of thin film transistors, wherein the projection lens radiates the laser beam onto the plurality of thin film transistors on the glass substrate, which moves in a predetermined direction, through the projection mask pattern, and the projection mask pattern is provided such that the openings are not continuous in one column orthogonal to the moving direction.