The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2021
Filed:
Dec. 16, 2019
Hitachi Kokusai Electric Inc., Tokyo, JP;
Yoshiyuki Oshida, Tokyo, JP;
Naoya Fujimoto, Tokyo, JP;
Norikazu Kato, Tokyo, JP;
Takeshi Okada, Tokyo, JP;
Tsuyoshi Takeda, Toyama, JP;
HITACHI KOKUSAI ELECTRIC INC., Tokyo, JP;
Abstract
To provide a RF generating apparatus that enables apparatus size to be decreased and the cost reduced thereby while also improving power efficiency by performing a stable matching operation, and to provide a plasma treatment apparatus using said apparatus. This RF generating apparatus comprises a plurality of RF generators and matching units, the matching units being provided with only variable-capacity capacitors connected in parallel, thereby reducing the number of elements in terms of the variable-capacity capacitors. A matching calculation section for the RF generators determines, on the basis of traveling waves and reflection waves detected by a detection circuit, the capacity values of the variable-capacity capacitors for the matching units, while adjusting and determining the oscillation frequencies for oscillation circuits in the RF generators so as to decrease the level of the reflection waves. The plasma treatment apparatus uses this RF generating apparatus.