The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 19, 2021

Filed:

Dec. 01, 2015
Applicants:

King Abdulaziz City for Science and Technology, Riyadh, SA;

Fraunhofer Institute for Silicate Research Isc, Wurzburg, DE;

Inventors:

Mohammed Abdullah Bahattab, Riyadh, SA;

Walther Glaubitt, Wurzburg, DE;

Mark Mirza, Wurzburg, DE;

Mohammed I Alhussani, Riyadh, SA;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09D 5/00 (2006.01); C09D 1/00 (2006.01); C03C 17/25 (2006.01); C09D 5/16 (2006.01);
U.S. Cl.
CPC ...
C09D 5/006 (2013.01); C03C 17/25 (2013.01); C09D 1/00 (2013.01); C09D 5/1681 (2013.01); C03C 2217/213 (2013.01); C03C 2217/70 (2013.01); C03C 2217/732 (2013.01); C03C 2218/111 (2013.01); C03C 2218/32 (2013.01);
Abstract

The invention provides a dust repellant and anti-reflective inorganic coating and the method for preparing the coating. The dust repellant and anti-reflective inorganic coating includes nano-porous silica (SiO) network of about 5 nm to about 35 nm and is characterized by cracks. The method of preparing the dust repellant and anti-reflective inorganic coating on a substrate includes mixing of aqueous SiOsolution with a solvent. The aqueous SiOsolution with the solvent is stirred to form a solution. The solution is coated on the substrate to form a film on the surface of the substrate. Thereafter, the film is annealed by heating the film to a temperature of about 500° C. to about 700° C. within a period of about 2 minutes to about 2 hours. Finally, the film is allowed to cool down.


Find Patent Forward Citations

Loading…