The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2021
Filed:
May. 10, 2019
Amg Co., Ltd., Tokyo, JP;
Hiroki Hasegawa, Tokyo, JP;
AMG CO., LTD., Tokyo, JP;
Abstract
A face mask for beauty treatment with a cosmetic composition in the user's face which has a convex and concave shape. The nose portion of the mask comes into contact with the user's nose, a plurality of adjustment structures formed independently of each other arranged in a portion on the left side of a center line and a portion on the right side thereof, respectively. Each adjustment structure is formed independently of a cut defining the external shape of the nose portion, and has a space boundary portion with two points separated in a direction different from a center line and forming a space through a cut connecting below or above the two points. A non-moving portion arranged in the space with the same shape as the space and at the location connecting the two points is connected to the main body of the face mask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile