The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2021
Filed:
Oct. 28, 2016
Leica Microsystems Cms Gmbh, Wetzlar, DE;
Hans-Martin Heuck, Wetzlar, DE;
Frank Eisenkraemer, Solms, DE;
LEICA MICROSYSTEMS CMS GMBH, Wetzlar, DE;
Abstract
A Mirau interference objective includes an objective lens and a splitter element arranged between the objective lens and an object to be examined. The splitter element is configured to split an incident light beam into a sample beam path and a reference beam path. The objective lens is configured to focus the sample beam path on the object to be examined. A mirror element is arranged between the splitter element and the objective lens. The mirror element is configured to reflect the reference beam path. A phase shift compensating element is configured to compensate for a wavelength-dependent phase shift between the reference beam path and the sample beam path which is superposed on the reference beam path.