The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2021
Filed:
Feb. 14, 2017
Hitachi, Ltd., Tokyo, JP;
Hideta Habara, Tokyo, JP;
Masaharu Ono, Tokyo, JP;
Tetsuhiko Takahashi, Tokyo, JP;
Hiroyuki Takeuchi, Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
To avoid the complication of an MRI apparatus and avoid the overestimation of a calculated value of SAR without extending a processing time and to perform accurate SAR management. To this end, the MRI apparatus is equipped with a high frequency antenna which has a plurality of channels and resonates at a predetermined frequency, and a measuring instrument which measures the amplitudes of a forward traveling and reflected waves of each high frequency signal supplied to the high frequency antenna. In the MRI apparatus, a reflection matrix S is determined based on the measured amplitudes. Diagonal terms of the determined reflection matrix S are used to calculate Q values for each of the channels. Each non-diagonal term of the reflection matrix S is used to correct the calculated Q value. The corrected Q value is used to calculate irradiation power consumed in a subject among irradiation power from the high frequency signals supplied to the high frequency antenna when imaging to thereby manage a specific absorption rate.