The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2021

Filed:

Apr. 24, 2017
Applicant:

The Japan Steel Works, Ltd., Tokyo, JP;

Inventors:

Keisuke Washio, Kanagawa, JP;

Tatsuya Matsumoto, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); H01L 21/67 (2006.01); C23C 16/455 (2006.01); H01L 21/687 (2006.01); H01L 51/50 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/44 (2013.01); C23C 16/45527 (2013.01); H01L 21/0228 (2013.01); H01L 21/02178 (2013.01); H01L 21/6719 (2013.01); H01L 21/68735 (2013.01); H01L 21/68757 (2013.01); H01L 21/68785 (2013.01); H01L 51/50 (2013.01);
Abstract

An atomic layer deposition apparatus includes: a film-forming containerin which a film-forming process is performed; a vertically movable stageprovided in the film-forming containerand being configured to hold a substrate; a stage stopperconfigured to stop rising of the stageand, when in contact with the stage, partitioning a film-forming space S in which the film-forming process is performed and a transporting space in which transport of the substrateis performed; a peripheral stage deposition prevention membercovering a peripheral portion of the stage; and a stage stopper deposition prevention memberprovided on the stage stopper


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