The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2021

Filed:

Mar. 21, 2019
Applicant:

Mitsubishi Chemical Corporation, Chiyoda-ku, JP;

Inventors:

Noritsugu Ooishi, Tokyo, JP;

Kouji Teramoto, Tokyo, JP;

Yasuharu Mori, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C 231/12 (2006.01); C07C 233/03 (2006.01);
U.S. Cl.
CPC ...
C07C 231/12 (2013.01); C07C 233/03 (2013.01);
Abstract

A method for producing N-vinylformamide through a vapor-phase thermal decomposition reaction using an evaporator () for evaporating a raw material, a thermal decomposition reactor () for thermally decomposing a raw material gas generated by the evaporator () and a condenser () for condensing a thermally decomposed gas generated by the thermal decomposition reactor (), wherein the evaporation of the raw material is started in the evaporator () while the temperature of a tube wall of a first connection tube () that connects the evaporator () to the thermal decomposition reactor () satisfies a requirement represented by formula (1): (temperature of tube wall (° C.))≥0.37×(pressure of evaporator (mmHg))+205.


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