The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2021
Filed:
Feb. 08, 2016
Applicant:
Fuji Corporation, Chiryu, JP;
Inventors:
Assignee:
FUJI CORPORATION, Chiryu, JP;
Primary Examiner:
Int. Cl.
CPC ...
B23K 3/00 (2006.01); B23K 3/08 (2006.01); B05C 11/04 (2006.01); B23K 1/00 (2006.01); B05C 5/02 (2006.01); B05C 5/00 (2006.01); B23K 1/20 (2006.01); H05K 13/04 (2006.01); H05K 3/34 (2006.01);
U.S. Cl.
CPC ...
B23K 3/082 (2013.01); B05C 5/002 (2013.01); B05C 5/027 (2013.01); B05C 5/0216 (2013.01); B05C 5/0291 (2013.01); B05C 11/04 (2013.01); B23K 1/00 (2013.01); B23K 1/203 (2013.01); B23K 3/00 (2013.01); H05K 13/0465 (2013.01); H05K 3/3489 (2013.01);
Abstract
A flux unit includes a flux supply device configured to eject flux to a storage tray, an ejection port configured to eject the flux, and an ejection port moving device configured to move the ejection port in the radial direction of the storage tray. By this, the flux is ejected in a wide range in the radial direction of the storage tray. Also, the storage tray is rotated by a tray rotation device. Thus, the film thickness of the flux ejected in the wide range of the storage tray is adjusted by a squeegee all at once. Thus, the time required for adjusting the film thickness of the flux can be reduced.