The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2021

Filed:

Feb. 13, 2018
Applicants:

Showa Denko K.k., Tokyo, JP;

A School Corporation Kansai University, Suita, JP;

Inventors:

Hiroshi Tani, Suita, JP;

Hiroshi Sakai, Ichihara, JP;

Eishin Yamakawa, Ichihara, JP;

Kazuki Shindo, Ichihara, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/48 (2006.01); B05D 1/00 (2006.01); G11B 5/84 (2006.01); G03F 7/00 (2006.01); C23C 16/503 (2006.01); G11B 5/725 (2006.01); B29C 33/58 (2006.01); B29C 33/62 (2006.01); B29C 33/38 (2006.01); G11B 5/72 (2006.01);
U.S. Cl.
CPC ...
B05D 1/60 (2013.01); B29C 33/58 (2013.01); C23C 16/48 (2013.01); C23C 16/482 (2013.01); C23C 16/503 (2013.01); G03F 7/0002 (2013.01); G11B 5/725 (2013.01); G11B 5/84 (2013.01); B29C 33/3842 (2013.01); B29C 33/62 (2013.01); G11B 5/727 (2020.08); G11B 5/7257 (2020.08);
Abstract

A film production method for producing a thin film on a surface of a workpiece, including the steps of: disposing the workpiece in a chamber; supplying a process gas into the chamber with the inside of the chamber being maintained at a predetermined pressure; applying a light having an energy between 3 eV and 10 eV to the surface of the workpiece to cause a photoelectron to be emitted from the surface of the workpiece; and applying an AC electric field to the surface of the workpiece, wherein the AC electric field has an electric field intensity causing a Townsend discharge to occur without generating a glow discharge plasma.


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