The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2021
Filed:
Jan. 27, 2020
Isteq B.v., Eindhoven, NL;
Rnd-isan, Ltd, Moscow, RU;
Vladimir Vitalievich Ivanov, Moscow, RU;
Aleksandr Yurievich Vinokhodov, Moscow, RU;
Konstantin Nikolaevich Koshelev, Moscow, RU;
Mikhail Sergeyevich Krivokorytov, Moscow, RU;
Vladimir Mikhailovich Krivtsun, Moscow, RU;
Aleksandr Andreevich Lash, Moscow, RU;
Vyacheslav Valerievich Medvedev, Moscow, RU;
Yury Viktorovich Sidelnikov, Moscow, RU;
Oleg Feliksovich Yakushev, Korolyev, RU;
Oleg Borisovich Khristoforov, Moscow, RU;
Denis Aleksandrovich Glushkov, Nieuwegein, NL;
Samir Ellwi, Crawley, GB;
ISTEQ B.V., Eindhoven, NL;
RnD-ISAN, Ltd, Moscow, RU;
Abstract
Laser-produced plasma light source contains a vacuum chamber with a rotating target assembly providing a target in an interaction zone with a laser beam focused on the said target, which is a molten metal layer. A debris shield is rigidly mounted to surround the interaction zone, said shield comprising only two opening forming an entrance for the laser beam and an exit for a short-wavelength radiation beam. The means for debris mitigation can additionally include: the rotation of target with high linear velocity exciding 80 m/s; the orientation of the short-wavelength radiation beam and/or of the laser beam at an angle of less than 45° to the target surface, a nozzle supplying a high-speed gas flow to the interaction zone, etc. The technical result is the creation of the high-brightness low-debris sources of soft X-ray, EUV and VUV light at wavelengths of 0.4 to 200 nm.