The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2021

Filed:

Dec. 21, 2018
Applicant:

United States of America As Represented BY the Administrator of Nasa, Washington, DC (US);

Inventors:

Sang H. Choi, Poquoson, VA (US);

Adam J. Duzik, Yorktown, VA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 35/34 (2006.01); H01L 35/30 (2006.01); H01L 35/32 (2006.01); C23C 14/14 (2006.01); H01L 27/16 (2006.01); C23C 14/04 (2006.01); H01L 35/20 (2006.01);
U.S. Cl.
CPC ...
H01L 35/34 (2013.01); C23C 14/042 (2013.01); C23C 14/14 (2013.01); H01L 27/16 (2013.01); H01L 35/20 (2013.01); H01L 35/30 (2013.01); H01L 35/325 (2013.01);
Abstract

Systems, methods, and devices of the various embodiments provide for microfabrication of devices, such as semiconductors, thermoelectric devices, etc. Various embodiments may include a method for fabricating a device, such as a semiconductor (e.g., a silicon (Si)-based complementary metal-oxide-semiconductor (CMOS), etc.), thermoelectric device, etc., using a mask. In some embodiments, the mask may be configured to allow molecules in a deposition plume to pass through one or more holes in the mask. In some embodiments, molecules in a deposition plume may pass around the mask. Various embodiments may provide thermoelectric devices having metallic junctions. Various embodiments may provide thermoelectric devices having metallic junctions rather than junctions formed from semiconductors.


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