The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2021

Filed:

Oct. 24, 2018
Applicant:

Fuji Electric Co., Ltd., Kawasaki, JP;

Inventor:

Ryo Maeta, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 29/423 (2006.01); H01L 29/739 (2006.01); H01L 29/10 (2006.01); H01L 21/761 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7811 (2013.01); H01L 29/0619 (2013.01); H01L 29/0634 (2013.01); H01L 29/0638 (2013.01); H01L 29/1095 (2013.01); H01L 29/66333 (2013.01); H01L 29/66712 (2013.01); H01L 29/7395 (2013.01); H01L 29/7802 (2013.01); H01L 29/7813 (2013.01);
Abstract

A semiconductor device has an active region through which current flows and a termination structure region. At a front surface of a semiconductor substrate of a first conductivity type, a first semiconductor layer of the first conductivity type is provided. At a surface of the first semiconductor layer, a lower parallel pn structure is provided. At a surface of the lower parallel pn structure, an upper parallel pn structure is provided in the termination structure region and a first semiconductor region of a second conductivity type is provided in the active region. A width of an upper second column is wider than a width of a lower second column. An interval between the upper second columns is wider than an interval between the lower second columns. A thickness of the upper second column is thicker than a thickness of the first semiconductor region.


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