The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2021
Filed:
Oct. 31, 2016
Emc Ip Holding Company Llc, Hopkinton, MA (US);
Diego Salomone Bruno, Niterói, BR;
Victor Bursztyn, Rio de Janeiro, BR;
Percy E. Rivera Salas, Rio de Janeiro, BR;
Tiago Salviano Calmon, Rio de Janeiro, BR;
EMC IP Holding Company LLC, Hopkington, MA (US);
Abstract
Relevance decay techniques are provided for time-based evaluation of machine learning applications and other classifiers. An exemplary method comprises obtaining time series measurement data; generating an input dataset comprising a plurality of records, wherein each record comprises features extracted from the time series measurement data, a target class corresponding to an event to be identified, and a time lag indicating a difference in time between a given extraction and the event to be identified; evaluating a plurality of classifiers during an evaluation phase using a portion of the input dataset and one or more predefined evaluation metrics weighted using a time-based relevance decay function based on the time lag; and selecting one or more of the classifiers to perform classification of the time series measurement data based on the predefined weighted evaluation metrics during a classification phase. The time lags indicate, for example, a time difference between classification moments of the plurality of classifiers and a respective instance of the event to be identified.