The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2021
Filed:
Sep. 04, 2019
International Business Machines Corporation, Armonk, NY (US);
David Wolpert, Poughkeepsie, NY (US);
Timothy A. Schell, Cary, NC (US);
Michael Gray, Fairfax, VT (US);
Erwin Behnen, Austin, TX (US);
Robert Mahlon Averill, III, Wappingers Falls, NY (US);
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
Methods, systems and computer program products for providing fin-based fill cell optimization are provided. Aspects include receiving a semiconductor layout comprising at least a first logic cell, a second logic cell, and a fill cell. A left boundary of the fill cell is adjacent to the first logic cell and a right boundary of the fill cell is adjacent to the second logic cell. Aspects also include determining a number of active left fins, right fins, and active fill cell fins associated with FinFET structures of the first logic cell, second logic cell and fill cell, respectively. Aspects also include comparing the number of active fins to a set of fin rules. Responsive to determining that the semiconductor layout violates the set of fin rules, aspects include modifying the semiconductor layout to change the number of active fill cell fins to satisfy the set of fin rules.