The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2021

Filed:

Oct. 22, 2014
Applicant:

South University of Science and Technology of China, Guangdong, CN;

Inventors:

Xing Cheng, Guangdong, CN;

Dehu Cui, Guangdong, CN;

Ziping Li, Guangdong, CN;

Jing Ming, Guangdong, CN;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7055 (2013.01); G03F 7/0037 (2013.01); G03F 7/2053 (2013.01); G03F 7/70041 (2013.01); G03F 7/70416 (2013.01); G03F 7/70641 (2013.01);
Abstract

Disclosed are a system and method for micro-nano machining by femtosecond laser two-photon polymerization. The system includes: a femtosecond laser, an external light path modulation unit, an image capture apparatus, a focusing lens, a displacement platform, a computer and a monitoring apparatus, where the image capture apparatus is configured to capture cross-section graphs of a three-dimensional micro-nano device layer by layer, so that modulated femtosecond lasers form parallel beams arranged according to all layers of the cross-section graphs.


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