The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2021

Filed:

Jul. 31, 2018
Applicant:

Rutgers, the State University of New Jersey, New Brunswick, NJ (US);

Inventors:

Jonathan Phillip Singer, Cranford, NJ (US);

Tianxing Ma, Somerset, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/10 (2006.01); H01S 3/00 (2006.01); G02B 27/09 (2006.01); G02B 26/06 (2006.01); G02B 26/00 (2006.01);
U.S. Cl.
CPC ...
G02B 27/1026 (2013.01); G02B 26/004 (2013.01); G02B 26/06 (2013.01); G02B 27/0977 (2013.01); H01S 3/0085 (2013.01);
Abstract

An apparatus and method for dynamic and reversible patterning of mask layers and manipulation and redistribution of energy sources such as laser beams. An embodiment of the present invention provides an apparatus including a mirror-like thin film comprising a front surface and a back surface configured to reflect a laser beam; a layer of a mask material on top of the front surface of the mirror-like thin film, wherein the mask material is transparent to the laser beam and is dewetted by a heat source to create a height profile in the mask material.


Find Patent Forward Citations

Loading…