The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2021
Filed:
Dec. 13, 2016
Applicants:
Xingjie NI, State College, PA (US);
Yuan Wang, Alamo, CA (US);
Xiang Zhang, Alamo, CA (US);
Inventors:
Assignee:
The Regents of the University of California, Oakland, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 15/02 (2006.01); F41H 3/02 (2006.01); H01Q 17/00 (2006.01);
U.S. Cl.
CPC ...
F41H 3/02 (2013.01); H01Q 17/005 (2013.01);
Abstract
This disclosure provides systems, methods, and devices related to a metasurface skin cloak. In one aspect, a metasurface skin cloak includes a dielectric layer and a plurality of blocks disposed on the dielectric layer. The dielectric layer is disposed over a surface including a feature on the surface. Each block of the plurality of blocks has a shape that is symmetric about two perpendicular axes. The metasurface skin can render the feature on the surface not optically detectable.