The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2021

Filed:

Dec. 19, 2016
Applicant:

Schlumberger Technology Corporation, Sugar Land, TX (US);

Inventors:

Philippe Enkababian, Richmond, TX (US);

David Sobernheim, Greenwood Village, CO (US);

Priyavrat Shukla, Houston, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
E21B 43/119 (2006.01); G01V 5/12 (2006.01); E21B 47/007 (2012.01); E21B 49/00 (2006.01);
U.S. Cl.
CPC ...
E21B 43/119 (2013.01); E21B 47/007 (2020.05); E21B 49/00 (2013.01); G01V 5/12 (2013.01);
Abstract

A method of performing a perforation operation is disclosed. The method involves generating a stress contrast distribution for each stage of a well based on drilling stress data and a stress log of the well, generating a stress association between the drilling stress data and the stress log, generating a new stress contrast distribution for each of the stages of a new well based on new wellsite data (new drilling stress data) and the stress association, generating a production forecast using the geometric completion (GC) design and a predicted production forecast based on the engineered completion (EC) design, comparing a cost of a new stress log of the new well with a change in revenue between the GC production forecast and the predicted production forecast, and selectively perforating the new well using either GC or EC design based on the comparing, whereby stress logging may be selectively performed.


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