The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2021
Filed:
Nov. 26, 2018
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Yeonock Han, Hwaseong-si, KR;
Wonwoong Chung, Suwon-si, KR;
Keum Seok Park, Seoul, KR;
Pankwi Park, Incheon, KR;
Jeongho Yoo, Seongnam-si, KR;
Younjoung Cho, Hwaseong-si, KR;
Byung Koo Kong, Yeongju-si, KR;
Mijeong Kim, Yeongju-si, KR;
Jin Wook Lee, Yeongju-si, KR;
Changeun Jang, Yeongju-si, KR;
Assignee:
SAMSUNG ELECTRONICS., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F17C 1/00 (2006.01); F17C 13/02 (2006.01); C23C 16/448 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/448 (2013.01); F17C 1/005 (2013.01); F17C 13/02 (2013.01); H01L 21/0254 (2013.01); H01L 21/0262 (2013.01); H01L 21/02458 (2013.01); H01L 21/02491 (2013.01); H01L 21/02642 (2013.01);
Abstract
A method of manufacturing a semiconductor device includes disposing a gas-storage cylinder storing monochlorosilane within a gas supply unit. The monochlorosilane is supplied from the gas-storage cylinder into a process chamber to form a silicon containing layer therein. The gas-storage cylinder includes manganese.