The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2021
Filed:
Aug. 23, 2018
Applicants:
Kuan-wei Chen, Tainan, TW;
Jason Shian-ching Jang, Tainan, TW;
Po-jen Wei, Tainan, TW;
Inventors:
Assignee:
Taichi Metal Material Technology Co., Ltd., Tainan, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C21D 7/06 (2006.01); B22F 9/00 (2006.01); B22F 9/08 (2006.01); B24C 1/10 (2006.01);
U.S. Cl.
CPC ...
C21D 7/06 (2013.01); B22F 9/002 (2013.01); B22F 9/082 (2013.01); B24C 1/10 (2013.01); B22F 2009/0848 (2013.01); B22F 2201/20 (2013.01);
Abstract
A dynamically impacting method comprising simultaneously peening a substrate surface and forming a thin film of metallic glass on the substrate surface for increasing the surface hardness, fatigue resistance, anti-fracture toughness and corrosion resistance of the substrate simultaneously.
Chen, Kuan-Wei. (2021). Dynamically impacting method for simultaneously peening and film-forming on substrate as bombarded by metallic glass particles (U.S. Patent No. 10883152). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10883152
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile