The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2021
Filed:
Oct. 03, 2019
Advanced Dressing, Llc, Cleveland, OH (US);
John Buan, Maple Grove, MN (US);
Richard L. Middaugh, Rocky River, OH (US);
Timothy Wojciechowski, Westlake, OH (US);
Thomas E. Lash, Chardon, OH (US);
Advanced Dressing, LLC, Cleveland, OH (US);
Abstract
A reduced pressure device includes a dressing and a reactor. The dressing covers a dressing site and defines an enclosed volume beneath the dressing and around the dressing site. The reactor is disposed with respect to the dressing so as to produce a reduced pressure beneath the dressing when activated. The reactor includes a reducing agent and an electrolyte solution. The electrolyte solution is configured to be selectively delivered to the reducing agent, and the reactor begins to react with at least one selected gas in the enclosed volume after the electrolyte solution is delivered to the reducing agent to consume the at least one selected gas within the enclosed volume.