The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2021

Filed:

Sep. 29, 2017
Applicant:

Koninklijke Philips N.v., Eindhoven, NL;

Inventors:

Johannes Cornelis Jans, Maasbracht, NL;

Rob Van Loon, Eindhoven, NL;

Niels Methorst, Best, NL;

Pascal Wolkotte, Best, NL;

Assignee:

KONINKLIJKE PHILIPS N.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 1/52 (2006.01); G21K 1/00 (2006.01); A61B 6/08 (2006.01); A61B 6/06 (2006.01); A61B 6/00 (2006.01);
U.S. Cl.
CPC ...
A61B 6/08 (2013.01); A61B 6/06 (2013.01); A61B 6/4441 (2013.01); A61B 6/587 (2013.01); A61B 6/542 (2013.01); A61B 6/582 (2013.01);
Abstract

An imaging system () comprises a beam source (), a detector unit (), a beam limiting unit (), and a control unit (). The beam source () generates a beam () and projects it onto the detector unit (), thus generating a radiated field () being limited by the beam limiting unit (). The detector unit () provides image data as a result of the beam (). The control unit () is configured to provide image data of a desired region of an object () by selecting a predetermined image field () of the detector unit. The control unit () is configured to determine a correction factor for a relative position and/or a relative orientation of the image field () with respect to the radiated field based on an orientation of the imaging system and to control the beam limiting unit as to reduce the cross-sectional area of the beam.


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