The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2020

Filed:

Jan. 16, 2020
Applicant:

Macronix International Co., Ltd., Hsinchu, TW;

Inventors:

Guan-Wei Wu, Zhubei, TW;

Yao-Wen Chang, Zhubei, TW;

I-Chen Yang, Zhunan Township, Miaoli County, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11582 (2017.01); G11C 16/14 (2006.01); H01L 29/36 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11582 (2013.01); G11C 16/14 (2013.01); H01L 29/36 (2013.01);
Abstract

A semiconductor device includes a substrate including a doped region of a first doping concentration that extends downward from an upper surface of the substrate; a first stack on the upper surface, including first insulating layers and first conductive layers alternatively stacked, a first channel layer, a first memory layer and a first conductive connector configured to receive a first voltage, the first conductive connector on the first channel layer, having a second doping concentration; a second stack on the first stack including second insulating layers and second conductive layers alternatively stacked, a second channel layer, a second memory layer, the second conductive layer configured to receive the second voltage; a second conductive connector on the second channel layer, configured to receive an erasing voltage, the first conductive connector electrically connected to the first and second channel layers; the first doping concentration smaller than the second doping concentration.


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