The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2020

Filed:

Nov. 13, 2015
Applicant:

Micro Focus Llc, Santa Clara, CA (US);

Inventors:

Gerald Sullivan, Alpharetta, GA (US);

Sasi Siddharth Muthurajan, Cambridge, MA (US);

Nidhi Kejriwal, Sunnyvale, CA (US);

Jeremy Brooks, Alpharetta, GA (US);

Assignee:

MICRO FOCUS LLC, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 11/00 (2006.01); G06F 12/14 (2006.01); G06F 12/16 (2006.01); G08B 23/00 (2006.01); G06F 21/57 (2013.01); G06F 21/55 (2013.01); G06F 21/62 (2013.01);
U.S. Cl.
CPC ...
G06F 21/577 (2013.01); G06F 21/554 (2013.01); G06F 21/629 (2013.01);
Abstract

Examples relate to automated multi-credential assessment in a system. One example enables auditing an application by sending a first request for an action to be performed in the application, the first request based on a first privilege level, where the first privilege level corresponds with a first level of access to the application, and sending a second request for the action to be performed in the application, where the second request based on a second privilege level different from the first privilege level. The second privilege level may corresponds with a second level of access to the application different from the first level of access. The first request and second request may be performed, and the results of the performed first request and second request may be combined. The combined results may be made available.


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