The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2020

Filed:

Oct. 17, 2018
Applicant:

Emc Ip Holding Company Llc, Hopkinton, MA (US);

Inventors:

Junping Zhao, Beijing, CN;

Fan Guo, Shanghai, CN;

Kun Wang, Shanghai, CN;

Assignee:

EMC IP Holding Company LLC, Hopkinton, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 9/46 (2006.01); G06F 9/48 (2006.01); G06F 9/50 (2006.01);
U.S. Cl.
CPC ...
G06F 9/4881 (2013.01); G06F 9/505 (2013.01);
Abstract

Embodiments of the present disclosure provide a method, apparatus and computer-readable medium for application scheduling. In accordance with embodiments of the present disclosure, influence factors related to scheduling of a plurality of applications between a plurality of processing units of a computing system are obtained, the plurality of applications being run by at least one of the plurality of processing units. Based on the obtained influence factors, a target application to be scheduled is selected from the plurality of applications and a first processing unit is selected from the plurality of processing units, the first processing unit being different from a second processing unit of the at least one processing unit running the target application. The target application is scheduled from the second processing unit to the first processing unit to continue running of the target application by the first processing unit.


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