The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2020
Filed:
Feb. 25, 2019
Toshiba Memory Corporation, Tokyo, JP;
Toshiaki Komukai, Kawasaki Kanagawa, JP;
TOSHIBA MEMORY CORPORATION, Tokyo, JP;
Abstract
A pattern forming method, including an imprinting process is provided. The method includes preparing a substrate having an organic film; forming a surface film, containing at least one of a metal or a semiconductor, in or on the surface of the organic film. The method further includes forming an inorganic film on the surface film; applying an organic mask material onto the inorganic film, and pressing a template having a fine pattern against the organic mask material to form a mask pattern; processing the inorganic film using the mask pattern as a mask; and removing the mask pattern. The organic mask material, when pressed by the template, is cured or solidified by being exposed to an ultraviolet light source. The solidified organic mask includes an overflow portion removable by plasma asking and exposing the surface film underneath.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile