The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2020

Filed:

May. 21, 2018
Applicant:

Olympus Corporation, Tokyo, JP;

Inventors:

Tadashi Hirata, Tokyo, JP;

Shintaro Takahashi, Tokyo, JP;

Assignee:

OLYMPUS CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/08 (2006.01); G02B 21/24 (2006.01); G02B 21/14 (2006.01); G02B 21/04 (2006.01);
U.S. Cl.
CPC ...
G02B 21/088 (2013.01); G02B 21/14 (2013.01); G02B 21/24 (2013.01); G02B 21/04 (2013.01);
Abstract

An observation device includes an illuminating optical system that emits illuminating light obliquely upward from below a sample; and an objective optical system that images transmitted light, which is the illuminating light emitted from the illuminating optical system, reflected above the sample, and passed through the sample, the objective optical system imaging the transmitted light below the sample and via a different path from that of the illuminating optical system. The illuminating optical system includes a light source, a mask that restricts light, which is emitted from the light source, to a particular emission region, and a collimating optical system that converts the light restricted by the mask into substantially parallel light, and the illuminating optical system is arranged so that when the region is projected onto a pupil plane of the objective optical system, a projected image of the region partially overlaps a peripheral portion of the pupil.


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