The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2020

Filed:

Dec. 03, 2013
Applicant:

Leica Biosystems Melbourne Pty Ltd, Mount Waverly, AU;

Inventors:

Peter Toogood, Vermont, AU;

Kenneth Heng-Chong Ng, Donvale, AU;

Anthony Favaloro, Richmond, AU;

Stephen John Bagnato, Mt. Waverley, AU;

Gregory William Boyes, Croydon, AU;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01L 7/00 (2006.01); G01N 1/31 (2006.01); G01N 1/44 (2006.01); G01N 1/30 (2006.01); F28F 3/02 (2006.01); F28F 3/12 (2006.01);
U.S. Cl.
CPC ...
G01N 1/31 (2013.01); B01L 7/00 (2013.01); B01L 7/52 (2013.01); G01N 1/30 (2013.01); G01N 1/44 (2013.01); B01L 2200/025 (2013.01); B01L 2200/141 (2013.01); B01L 2300/043 (2013.01); B01L 2300/0822 (2013.01); B01L 2300/18 (2013.01); B01L 2300/1822 (2013.01); B01L 2300/1827 (2013.01); B01L 2300/1844 (2013.01); F28F 3/02 (2013.01); F28F 3/12 (2013.01);
Abstract

A thermal system for controllably altering a temperature within a reaction chamber in a sample processing assembly is described. The reaction chamber is bounded by a substrate and cover member in the sample processing assembly. The thermal system includes at least one thermal generator for generating temperature changes, one or more transfer layers for transferring temperature changes between the thermal generator and the sample on the substrate and a fluid isolator for isolating the thermal generator from fluid dispensed into the reaction chamber.


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