The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2020
Filed:
Jan. 10, 2019
Quanex Ig Systems, Inc., Cambridge, OH (US);
Leslie M. Canning, Jr., Cambridge, OH (US);
Nathan T. Tuttle, New Concord, OH (US);
Cody J. Walsh, Salmon, WA (US);
Joseph D. Florio, Cambridge, OH (US);
Kenneth F. Wayman, Port Washington, OH (US);
Quanex IG Systems, Inc., Cambridge, OH (US);
Abstract
A method for applying a patch to a spacer discontinuity or other seal breach includes the step of applying pressure to the patch during the application of the patch to cause sealant carried by the patch to be injected into the spacer discontinuity. This step can be performed with or without the application of heat. Pressure is applied to the patch long enough to position the sealant entirely across the gap between the lites such that the sealant wets out against both interior glass surfaces. Pressure is also applied to the patch long enough to inject sealant into openings defining the discontinuity. A sealant is then applied over the entire patch. The structure of the patch and the patched IG unit are provided.