The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2020

Filed:

Aug. 31, 2016
Applicant:

Silcotek Corp., Bellefonte, PA (US);

Inventors:

Thomas F. Vezza, State College, PA (US);

James B. Mattzela, Port Matilda, PA (US);

Gary A. Barone, State College, PA (US);

William David Grove, Boalsburg, PA (US);

Paul H. Silvis, Port Matilda, PA (US);

Assignee:

SILCOTEK CORP., Bellefonte, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/24 (2006.01); C23C 16/04 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45523 (2013.01); C23C 16/24 (2013.01); C23C 16/045 (2013.01);
Abstract

Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The thermal chemical vapor deposition coated article includes a substrate and a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques. The coating has a concentration of particulate from gas phase nucleation, per 100 square micrometers, of fewer than 6 particles having a dimension of greater than 0.5 micrometers. The thermal chemical vapor deposition process includes introducing a multiple aliquot of a silicon-containing precursor to the enclosed vessel with intermediate gaseous soaking to produce the coated article.


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