The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2020
Filed:
Mar. 06, 2017
Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno, 's Gravenhage, NL;
Technische Universiteit Delft, Delft, NL;
Pieter Thijs Eendebak, Utrecht, NL;
Timothy Alexander Baart, Amstelveen, NL;
Lieven Mark Koenraad Vandersypen, Delft, NL;
Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO, 's-Gravenhage, NL;
Technische Universiteit Delft, Delft, NL;
Abstract
Quantum dot circuit and a method of characterizing such a circuit Voltages that enable control of electron occupation in a series of quantum dots are determined by a method of measuring effects of gate electrode voltages on a quantum dot circuit. The quantum dot circuit comprises a channel (), first gate electrodes (-) that extend over locations along the edge of the channel to create potentials barriers defining the potentials well therebetween, as well as second gate electrodes (-) adjacent to potential wells, for controlling depths of the successive electrical potential wells between the potential barriers. First, channel currents are measured in a pre-scan of bias voltages of the first gates for controlling the potential barriers. The result is used to set their bias levels in, a scan over a two-dimensional range of combinations of bias voltages on the second gates for controlling the depths. In this scan an indication of charge carrier occupation of potential wells at consecutive positions along the channel such as electromagnetic wave reflection is measured. Pattern matching with a pattern of crossing occupation edges is applied to the result. This involves a two-dimensional image that has the combinations of the bias voltages as image points and the indication of charge carrier occupation as image values. The pattern matching detects an image point where the image matches a pattern of crossing edges along predetermined directions.