The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2020
Filed:
Sep. 27, 2018
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Do-hoon Kim, Hwaseong-si, KR;
Tae-hyung Kim, Seoul, KR;
Jong-min Baek, Incheon, KR;
Han-dock Song, Cheongju-si, KR;
Assignees:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Wonik Materials, Cheongju-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/00 (2006.01); H01L 21/3213 (2006.01); H01L 21/3065 (2006.01); H01L 21/311 (2006.01); H01L 27/108 (2006.01);
U.S. Cl.
CPC ...
H01L 21/32139 (2013.01); C09K 13/00 (2013.01); H01L 21/3065 (2013.01); H01L 21/31116 (2013.01); H01L 21/32137 (2013.01); H01L 27/10885 (2013.01);
Abstract
An etching gas mixture, a method of forming a pattern using the etching gas mixture, and a method of manufacturing an integrated circuit device using the etching gas mixture, the etching gas mixture including a C1-C3 perfluorinated alkyl hypofluorite; and a C1-C10 organosulfur compound that includes a C—S bond in the compound.