The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2020
Filed:
Sep. 20, 2017
New York University, New York, NY (US);
Nikhil Gupta, Ossining, NY (US);
NEW YORK UNIVERSITY, New York, NY (US);
Abstract
A method for securing a computer-aided design (CAD)-based shape to prevent shape counterfeiting by unauthorized three-dimensional (3D) printing includes creating and embedding a security element in the CAD-based shape itself. In some embodiments, the method includes splitting (slicing) a first solid of a three-dimensional 3D model into at least two parts, such that the 3D model comprises at least two distinct solids. The shape of the distinct solid(s) may be specified by a plurality of curved surfaces, which are defined by performing a finite element analysis on the CAD-based shape to determine an optimal shape for each curved surface. The method further includes converting the 3D model to a digital surface geometry schema according to a first resolution. The digital surface geometry schema describes the surface geometry of the at least two distinct solids. The first resolution is part of the security controls of the CAD-based shape. The first resolution may be selected based on a shape of the split of the first solid, a location of the split of the first solid, a 3D printer type, an anticipated horizontal print direction, an anticipated vertical print direction, an anticipated slicer software scheme, an anticipated slice thickness, and/or an anticipated slice location.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile