The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 22, 2020

Filed:

Jun. 29, 2017
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Katsutoshi Sakai, Utsunomiya, JP;

Tadashi Hattori, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B29C 33/42 (2006.01); B29C 59/02 (2006.01); H01L 21/027 (2006.01); B29C 43/58 (2006.01); B29L 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 33/424 (2013.01); B29C 59/02 (2013.01); H01L 21/027 (2013.01); B29C 43/58 (2013.01); B29L 2007/002 (2013.01);
Abstract

The present invention provides an imprint apparatus which forms a pattern of an imprint material on a substrate by using a mold, the apparatus including a mold holding unit configured to hold the mold, a substrate holding unit configured to hold the substrate, an image capturing unit configured such that a field of view of the image capturing unit includes a pattern region of the mold held by the molding unit, and a control unit configured to determine, based on an image obtained by capturing at least one of the mold and the substrate by the image capturing unit after a mold separating operation for separating the mold from a cured imprint material on the substrate, whether an abnormality is generated in the mold separating operation.


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