The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2020
Filed:
Jan. 24, 2018
Applicant:
Nikon Corporation, Tokyo, JP;
Inventors:
Steven Douglas Slonaker, San Mateo, CA (US);
Stephen P. Renwick, Moss Beach, CA (US);
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/42 (2012.01); G03F 1/22 (2012.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01); H01L 23/544 (2006.01); H01L 21/027 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G03F 1/42 (2013.01); G03F 1/22 (2013.01); G03F 7/2004 (2013.01); G03F 9/7076 (2013.01); H01L 21/0274 (2013.01); H01L 22/20 (2013.01); H01L 22/30 (2013.01); H01L 23/544 (2013.01); H01L 2223/54426 (2013.01);
Abstract
Alignment patterns that are selected based on device pattern spatial frequencies are defined on a reticle. The alignment patterns can include periodic arrays of lines, spaces, dots, of other pattern elements. Such patterns can be defined as sets associated with a common spatial frequency or frequency range, or some or all sets can include alignment marks having mark elements associated with different spatial frequencies.