The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2020
Filed:
Aug. 04, 2017
Daikin Industries, Ltd., Osaka, JP;
Ken Yoshida, Osaka, JP;
Hirotoshi Yoshida, Osaka, JP;
Keisuke Hagi, Osaka, JP;
Masayuki Tsuji, Osaka, JP;
Taketo Kato, Osaka, JP;
Yuuji Tanaka, Osaka, JP;
Taku Yamanaka, Osaka, JP;
Kazuya Kawahara, Osaka, JP;
Masamichi Sukegawa, Osaka, JP;
Kazutaka Hosokawa, Osaka, JP;
DAIKIN INDUSTRIES, LTD., Osaka, JP;
Abstract
The invention provides a production method for producing low molecular weight polytetrafluoroethylene enabling easy removal of most of C8-C14 perfluorocarboxylic acids and salts thereof, which are unfortunately generated by irradiation, from the low molecular weight polytetrafluoroethylene. The method for producing low molecular weight polytetrafluoroethylene includes: (1) irradiating polytetrafluoroethylene to provide low molecular weight polytetrafluoroethylene having a melt viscosity of 1×10to 7×10Pa·s at 380° C.; (2) pulverizing the low molecular weight polytetrafluoroethylene; and (3) heating the low molecular weight polytetrafluoroethylene pulverized in the step (2).